Focused electron-beam induced processing (FEBIP) enables the direct deposition and etching of functional materials with nanoscale resolution. The process has found application in integrated circuit edit and mask repair, nanoscale rapid prototyping, and interconnection to chemically synthesized nanostructures.
Fra i morgen kl 14:00 to i morgen kl 15:00
Fra i morgen kl 14:00 to i morgen kl 15:00